Nanostructured thin films of CaF2 have been deposited in vacuum by ultra-short pulse laser ablation. The laser-induced plasma, characterized by optical emission spectroscopy and ICCD fast imaging, shows the presence of Ca and F atomic species, neutral and ionized, together with the CaF molecular species. Although continuous blackbody-like emission has not been detected from the plasma, the deposited films, characterized by Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, are apparently formed by the coalescence of a large number of nanoparticles composed by stoichiometric CaF2.
Femtosecond laser ablation of CaF2: plasma characterization and thin films deposition
DE BONIS, ANGELA;GALASSO, Agostino;SANSONE, MARIA;TEGHIL, Roberto
2014-01-01
Abstract
Nanostructured thin films of CaF2 have been deposited in vacuum by ultra-short pulse laser ablation. The laser-induced plasma, characterized by optical emission spectroscopy and ICCD fast imaging, shows the presence of Ca and F atomic species, neutral and ionized, together with the CaF molecular species. Although continuous blackbody-like emission has not been detected from the plasma, the deposited films, characterized by Scanning Electron Microscopy and X-ray Photoelectron Spectroscopy, are apparently formed by the coalescence of a large number of nanoparticles composed by stoichiometric CaF2.File in questo prodotto:
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